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Vertical tracks on the sidewall of a silicon die using 3D holographic photolithography

Toriz-Garcia, J.J.; Williams, G.L.; McWilliam, R.; Seed, N.L.; Purvis, A.; Soulard, F.B.; Cowling, J.J.; Ivey, P.A.

Authors

J.J. Toriz-Garcia

G.L. Williams

R. McWilliam

N.L. Seed

F.B. Soulard

J.J. Cowling

P.A. Ivey



Abstract

We describe the patterning of multiple 10 µm wide conductive tracks down the vertical sidewall of a 500 µm thick silicon die. A novel photolithographic technique is used, which utilizes a computer-generated hologram mask in conjunction with a diffraction grating. 3D holographic photolithography is a powerful method for eliminating the troublesome diffractive line broadening that is usually encountered when patterning non-planar substrates. When used in conjunction with a diffraction grating, it creates the possibility to pattern fine features onto vertical surfaces—an achievement outside the normal realm of photolithography. The technique has many potential applications in MEMS, microsystem integration and packaging.

Citation

Toriz-Garcia, J., Williams, G., McWilliam, R., Seed, N., Purvis, A., Soulard, F., …Ivey, P. (2011). Vertical tracks on the sidewall of a silicon die using 3D holographic photolithography. Journal of Micromechanics and Microengineering, 21(8), Article 085034. https://doi.org/10.1088/0960-1317/21/8/085034

Journal Article Type Article
Publication Date Aug 1, 2011
Deposit Date Oct 6, 2010
Journal Journal of Micromechanics and Microengineering
Print ISSN 0960-1317
Electronic ISSN 1361-6439
Publisher IOP Publishing
Peer Reviewed Peer Reviewed
Volume 21
Issue 8
Article Number 085034
DOI https://doi.org/10.1088/0960-1317/21/8/085034
Keywords Electronics and devices, Optics, Quantum optics, Lasers.


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