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Gold film with gold nitride-A conductor but harder than gold.

Šiller, L. and Peltekis, N. and Krishnamurthy, S. and Chao, Y. and Bull, S. J. and Hunt, M. R. C. (2005) 'Gold film with gold nitride-A conductor but harder than gold.', Applied physics letters., 86 (22). p. 221912.

Abstract

The formation of surface nitrides on gold films is a particularly attractive proposition, addressing the need to produce harder, but still conductive, gold coatings which reduce wear but avoid the pollution associated with conventional additives. Here we report production of large area gold nitride films on silicon substrates, using reactive ion sputtering and plasma etching, without the need for ultrahigh vacuum. Nanoindentation data show that gold nitride films have a hardness ~50% greater than that of pure gold. These results are important for large-scale applications of gold nitride in coatings and electronics.

Item Type:Article
Keywords:Gold, Metallic thin films, Gold compounds, Hardness, Wear resistant coatings, Sputtered coatings, Sputter etching, Indentation.
Full text:PDF - Published Version (145Kb)
Status:Peer-reviewed
Publisher Web site:http://dx.doi.org/10.1063/1.1941471
Publisher statement:Copyright (2005) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. Šiller, L. and Peltekis, N. and Krishnamurthy, S. and Chao, Y. and Bull, S. J. and Hunt, M. R. C. (2005) 'Gold film with gold nitride-A conductor but harder than gold.', Applied physics letters., 86 (22). p. 221912. and may be found at http://link.aip.org/link/?apl/86/221912
Record Created:04 Dec 2006
Last Modified:21 Apr 2011 13:25

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