Pym, A. T. G. and Lamperti, A. and Tanner, B. K. and Dimopoulos, T. and Ruhrig, M. and Wecker, J. (2006) 'Interface sharpening in CoFeB magnetic tunnel junctions.', Applied physics letters., 88 (16). p. 162505.
We report grazing incidence x-ray scattering evidence for sharpening of the interface between amorphous Co60Fe20B20 and AlOx during in situ annealing below the Co60Fe20B20 crystallization temperature. Enhancement of the interference fringe amplitude in the specular scatter and the absence of changes in the diffuse scatter indicate that the sharpening is not a reduction in topological roughness but a reduction in the width of the chemical composition profile across the interface. The temperature at which the sharpening occurs corresponds to that at which a maximum is found in the tunneling magnetoresistance of magnetic tunnel junctions.
|Keywords:||Room temperature, Layers.|
|Full text:||PDF - Published Version (89Kb)|
|Publisher Web site:||http://dx.doi.org/10.1063/1.2195774|
|Publisher statement:||© 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Pym, A. T. G. and Lamperti, A. and Tanner, B. K. and Dimopoulos, T. and Ruhrig, M. and Wecker, J. (2006) 'Interface sharpening in CoFeB magnetic tunnel junctions.', Applied physics letters., 88 (16). p. 162505 and may be found at http://dx.doi.org/10.1063/1.2195774|
|Record Created:||04 Dec 2006|
|Last Modified:||18 Aug 2015 13:16|
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