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High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation

McWilliam, R.; Purvis, A.; Williams, G.L.; Soulard, F.B.; Seed, N.L.

Authors

R. McWilliam

A. Purvis

G.L. Williams

F.B. Soulard

N.L. Seed



Abstract

By pre-seeding the phase distribution of a point-oriented CGH, controlled-width line patterns are generated with high contrast (>0.6) for precision imaging applications such as photolithography. The approach is extensible to binary phase CGH and 3-D line patterns.

Citation

McWilliam, R., Purvis, A., Williams, G., Soulard, F., & Seed, N. (2015). High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation. In Digital holography and three-dimensional imaging : 24-28 May 2015, Shanghai, China ; OSA annual topical meeting. https://doi.org/10.1364/dh.2015.dth4a.4

Conference Name Digital Holography and Three-Dimensional Imaging 2015
Conference Location Shanghai
Acceptance Date May 12, 2015
Publication Date May 28, 2015
Deposit Date Jun 15, 2015
Publisher Optical Society of America (OSA)
Series Title OSA technical digest
Book Title Digital holography and three-dimensional imaging : 24-28 May 2015, Shanghai, China ; OSA annual topical meeting.
DOI https://doi.org/10.1364/dh.2015.dth4a.4

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