Skip to main content

Research Repository

Advanced Search

Nanometer scale patterning using focused ion beam milling

Petit, D.; Faulkner, C.C.; Johnstone, S.; Wood, D.; Cowburn, R.P.

Nanometer scale patterning using focused ion beam milling Thumbnail


Authors

D. Petit

C.C. Faulkner

S. Johnstone

D. Wood

R.P. Cowburn



Abstract

We report on the performance of focused ion beam (FIB) milling in order to produce nanometer scale devices. Resolution issues have been systematically studied as a function of emission current and working distance, by imaging single pixel lines FIB milled into thin bismuth films deposited on oxidized silicon. The ion beam profile has been measured, and by carefully optimizing the milling conditions, 40 nm Hall probe sensors have been fabricated.

Citation

Petit, D., Faulkner, C., Johnstone, S., Wood, D., & Cowburn, R. (2005). Nanometer scale patterning using focused ion beam milling. Review of Scientific Instruments, 76(2), Article 026105. https://doi.org/10.1063/1.1844431

Journal Article Type Article
Publication Date 2005-02
Deposit Date Jun 5, 2006
Publicly Available Date Apr 21, 2011
Journal Review of Scientific Instruments
Print ISSN 0034-6748
Electronic ISSN 1089-7623
Publisher American Institute of Physics
Peer Reviewed Peer Reviewed
Volume 76
Issue 2
Article Number 026105
DOI https://doi.org/10.1063/1.1844431

Files

Published Journal Article (195 Kb)
PDF

Copyright Statement
Copyright (2005) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

The following article appeared in (Petit, D. and Faulkner, C. C. and Johnstone, S. and Wood, D. and Cowburn, R. P. (2005) Nanometer scale patterning using focused ion beam milling. Review of scientific instruments., 76 (2). 3. ISSN 0034-6748) and may be found at http://link.aip.org/link/?rsi/76/026105





You might also like



Downloadable Citations