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Nonplanar photolithography with computer-generated holograms.

Maiden, A. and McWilliam, R. and Purvis, A. and Johnson, S. and Williams, G. L. and Seed, N. L. and Ivey, P. A. (2005) 'Nonplanar photolithography with computer-generated holograms.', Optics letters., 30 (11). pp. 1300-1302.

Abstract

We outline a method for accomplishing photolithography on grossly nonplanar substrates. First we compute an approximation of the diffraction pattern that will produce the desired light-intensity distribution on the substrate to be patterned. This pattern is then digitized and converted into a format suitable for manufacture by a direct-write method. The resultant computer-generated hologram mask is then used in a custom alignment tool to expose the photoresist-coated substrate. The technique has many potential applications in the packaging of microelectronics and microelectromechanical systems.

Item Type:Article
Keywords:Holography, Imaging systems, Microlithography.
Full text:PDF - Published Version (98Kb)
Status:Peer-reviewed
Publisher Web site:http://dx.doi.org/10.1364/OL.30.001300
Publisher statement:© 2005 Optical Society of America.
Record Created:23 Apr 2008
Last Modified:10 Nov 2010 12:05

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