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Nonplanar photolithography with computer-generated holograms

Maiden, A.; McWilliam, R.; Purvis, A.; Johnson, S.; Williams, G.L.; Seed, N.L.; Ivey, P.A.

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Authors

A. Maiden

R. McWilliam

S. Johnson

G.L. Williams

N.L. Seed

P.A. Ivey



Abstract

We outline a method for accomplishing photolithography on grossly nonplanar substrates. First we compute an approximation of the diffraction pattern that will produce the desired light-intensity distribution on the substrate to be patterned. This pattern is then digitized and converted into a format suitable for manufacture by a direct-write method. The resultant computer-generated hologram mask is then used in a custom alignment tool to expose the photoresist-coated substrate. The technique has many potential applications in the packaging of microelectronics and microelectromechanical systems.

Citation

Maiden, A., McWilliam, R., Purvis, A., Johnson, S., Williams, G., Seed, N., & Ivey, P. (2005). Nonplanar photolithography with computer-generated holograms. Optics Letters, 30(11), 1300-1302. https://doi.org/10.1364/ol.30.001300

Journal Article Type Article
Publication Date 2005-06
Deposit Date Apr 23, 2008
Publicly Available Date Nov 10, 2010
Journal Optics Letters
Print ISSN 0146-9592
Electronic ISSN 1539-4794
Publisher Optica
Peer Reviewed Peer Reviewed
Volume 30
Issue 11
Pages 1300-1302
DOI https://doi.org/10.1364/ol.30.001300
Keywords Holography, Imaging systems, Microlithography.
Publisher URL http://ol.osa.org/abstract.cfm?id=84040

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Published Journal Article (100 Kb)
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Copyright Statement
© 2005 Optical Society of America.







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