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Photolithographic patterning of bi-helical tracks onto conical substrates.

Purvis, A. and McWilliam, R. and Johnson, S. and Seed, N. and Williams, G. and Maiden, A. and Ivey, P. (2007) 'Photolithographic patterning of bi-helical tracks onto conical substrates.', Journal of micro/nanolithography, MEMS and MOEMS., 6 (4). 043015.

Abstract

We demonstrate the direct photolithographic patterning of a grossly non-planar substrate by creating 62 micron helical tracks on a 22 mm high cone. The projection of focused light on to the three dimensional surface is achieved using a computer generated hologram (CGH) suitably illuminated so as to create the required pattern on the photoresist coated surface. The approach adopted forms the basis of a novel method for the patterning of non-planar structures. We address the key challenges encountered for the implementation of holographic photolithography in three dimensions, including mask design and manufacture, exposure compensation, mask alignment and chemical processing. Control of line width and resolution over the non-planar surface is critical. We describe the methods adopted and critically assess the structures created by this process. The bi-helical cone is representative of a broadband, high frequency coil like structure, known in wireless communications as a log-periodic antenna.

Item Type:Article
Keywords:Holography, Lithography, Log-periodic antennas.
Full text:PDF - Published Version (178Kb)
Status:Peer-reviewed
Publisher Web site:http://dx.doi.org/10.1117/1.2824377
Publisher statement:Copyright 2007 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Record Created:10 Oct 2008
Last Modified:06 Sep 2011 09:24

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