Wacher, Abigail and Seymour, Brian (2011) 'A radiation model of a rapid thermal processing system.', Mathematics-in-industry case studies., 3 . pp. 1-18.
A model of the radiative heat transfer that takes place in an axially symmetric rapid thermal processing chamber is presented. The model is derived using the theory of shape factors, and is used to predict how chamber geometry and materials affect temperature uniformity on the processed silicon wafer. Using a series of numerical experiments we predict the effects on the temperature uniformity of the size and reflectivity of the showerhead, the guard ring, and the chamber height.
|Keywords:||Radiation, Modelling, Rapid Thermal Processing, Industrial mathematical modelling.|
|Full text:||PDF - Published Version (294Kb)|
|Publisher Web site:||http://www.fields.utoronto.ca/journalarchive/mics/35.html|
|Record Created:||27 Jan 2011 11:20|
|Last Modified:||30 Oct 2015 16:09|
|Social bookmarking:||Export: EndNote, Zotero | BibTex|
|Usage statistics||Look up in GoogleScholar | Find in a UK Library|