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A Radiation Model of a Rapid Thermal Processing System

Wacher, Abigail; Seymour, Brian

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Authors

Abigail Wacher

Brian Seymour



Abstract

A model of the radiative heat transfer that takes place in an axially symmetric rapid thermal processing chamber is presented. The model is derived using the theory of shape factors, and is used to predict how chamber geometry and materials affect temperature uniformity on the processed silicon wafer. Using a series of numerical experiments we predict the effects on the temperature uniformity of the size and reflectivity of the showerhead, the guard ring, and the chamber height.

Citation

Wacher, A., & Seymour, B. (2011). A Radiation Model of a Rapid Thermal Processing System. Mathematics-in-industry case studies, 3, 1-18

Journal Article Type Article
Publication Date Jan 1, 2011
Deposit Date Jan 26, 2011
Publicly Available Date Mar 28, 2024
Journal Mathematics-in-Industry Case Studies
Publisher Springer
Peer Reviewed Peer Reviewed
Volume 3
Pages 1-18
Keywords Radiation, Modelling, Rapid Thermal Processing, Industrial mathematical modelling.
Publisher URL http://www.fields.utoronto.ca/journalarchive/mics/35.html

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