A radiation model of a rapid thermal processing system.

Abstract

A model of the radiative heat transfer that takes place in an axially symmetric rapid thermal processing chamber is presented. The model is derived using the theory of shape factors, and is used to predict how cham- ber geometry and materials aect temperature uniformity on the processed silicon wafer. Using a series of numerical experiments we predict the eects on the temperature uniformity of the size and re ectivity of the showerhead, the guard ring, and the chamber height.