Abigail Wacher
A Radiation Model of a Rapid Thermal Processing System
Wacher, Abigail; Seymour, Brian
Authors
Brian Seymour
Abstract
A model of the radiative heat transfer that takes place in an axially symmetric rapid thermal processing chamber is presented. The model is derived using the theory of shape factors, and is used to predict how chamber geometry and materials affect temperature uniformity on the processed silicon wafer. Using a series of numerical experiments we predict the effects on the temperature uniformity of the size and reflectivity of the showerhead, the guard ring, and the chamber height.
Citation
Wacher, A., & Seymour, B. (2011). A Radiation Model of a Rapid Thermal Processing System. Mathematics-in-industry case studies, 3, 1-18
Journal Article Type | Article |
---|---|
Publication Date | Jan 1, 2011 |
Deposit Date | Jan 26, 2011 |
Publicly Available Date | Mar 29, 2024 |
Journal | Mathematics-in-Industry Case Studies |
Publisher | Springer |
Peer Reviewed | Peer Reviewed |
Volume | 3 |
Pages | 1-18 |
Keywords | Radiation, Modelling, Rapid Thermal Processing, Industrial mathematical modelling. |
Publisher URL | http://www.fields.utoronto.ca/journalarchive/mics/35.html |
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