Hindmarch, A.T. and Parkes, D.E. and Rushforth, A.W. (2012) 'Fabrication of metallic magnetic nanostructures by argon ion milling using a reversed polarity planar magnetron ion source.', Vacuum., 86 (10). pp. 1600-1604.
We demonstrate that a planar magnetron may be used as a source of ions for milling micro- and nanostructured devices. Reversing the polarity of the magnetron head, in combination with applying a voltage bias to the thin-film sample, allows acceleration of ions produced in the Ar glow-discharge to energies suitable for pattern transfer via etching. We have fabricated generic Hall-bar and nanowire L-bar structures from sputter deposited Ta/Ni/Ta trilayer films grown onto clean GaAs(001) surfaces. No degradation of the magnetic properties or contamination of the deposition chamber vacuum are observed, demonstrating that this method is effective for etching magnetic device structures patterned by both optical and electron-beam lithography techniques.
|Keywords:||Argon ion milling, Microfabrication, Lithography.|
|Full text:||(AM) Accepted Manuscript|
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|Publisher Web site:||http://dx.doi.org/10.1016/j.vacuum.2012.02.019|
|Publisher statement:||NOTICE: this is the author’s version of a work that was accepted for publication in Vacuum. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Vacuum, 86, 10, 2012, 10.1016/j.vacuum.2012.02.019|
|Record Created:||03 Apr 2012 15:05|
|Last Modified:||26 Jun 2012 11:58|
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