Simple de-embedding and simulation technique to find permittivity with a THz vector network analyser

Hammler, J.; Gallant, A.J.; Balocco, C.

doi:10.1109/irmmw-thz.2015.7327822

Simple de-embedding and simulation technique to find permittivity with a THz vector network analyser

Hammler, J.; Gallant, A.J.; Balocco, C.

Authors

Mr Jonathan Mark Hammler jonathan.hammler@durham.ac.uk
PGR Student Doctor of Philosophy

Professor Andrew Gallant a.j.gallant@durham.ac.uk
Professor

Professor Claudio Balocco claudio.balocco@durham.ac.uk
Professor

Abstract

A simple and fast method for measuring the dielectric constant with a THz vector network analyser (VNA) has been developed. A numeric de-embedding technique removes free-space propagation effects, then simulation of Maxwell's equations simultaneously fits both permittivity and thickness to measured scattering parameters. Results are presented for semiconductor and dielectric samples within the frequency range 750 GHz to 1.1 THz, showing excellent agreement with prior work. A statistical analysis of uncertainty is performed, which demonstrates the robustness of our method.

Citation

Hammler, J., Gallant, A., & Balocco, C. (2015). Simple de-embedding and simulation technique to find permittivity with a THz vector network analyser. In 40th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz), 23-28 August 2015, Hong Kong (1-2). https://doi.org/10.1109/irmmw-thz.2015.7327822

Conference Name	2015 40th International Conference on Infrared, Millimeter, and Terahertz waves (IRMMW-THz)
Conference Location	Hong Kong, China
Start Date	Aug 23, 2015
End Date	Aug 28, 2015
Acceptance Date	Aug 23, 2015
Publication Date	Aug 23, 2015
Deposit Date	Dec 7, 2015
Publicly Available Date	Jan 26, 2016
Publisher	Institute of Electrical and Electronics Engineers
Pages	1-2
Series Title	IEEE Conference Proceedings
Book Title	40th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz), 23-28 August 2015, Hong Kong.
DOI	https://doi.org/10.1109/irmmw-thz.2015.7327822
Keywords	Frequency measurement, Permittivity, Permittivity measurement, Scattering parameters, Semiconductor device measurement, Thickness measurement.
Additional Information	Date of Conference: 23-28 August 2015

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