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Electrically enhanced magnetization in highly strained BiFeO3 films

Yang, Jan-Chi; Kuo, Chang-Yang; Liu, Heng-Jui; Ding, Hang-Chen; Duan, Chun-Gang; Lin, Hong-Ji; Hu, Zhiwei; Pi, Tun-Wen; Tjeng, Liu Hao; Chen, Chien-Te; Arenholz, Elke; He, Qing; Chu, Ying-Hao

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Authors

Jan-Chi Yang

Chang-Yang Kuo

Heng-Jui Liu

Hang-Chen Ding

Chun-Gang Duan

Hong-Ji Lin

Zhiwei Hu

Tun-Wen Pi

Liu Hao Tjeng

Chien-Te Chen

Elke Arenholz

Ying-Hao Chu



Abstract

The control of magnetism via an electric field has attracted substantial attention because of potential applications in magnetoelectronics, spintronics and high-frequency devices. In this study, we demonstrate a new approach to enhance and control the magnetization of multiferroic thin film by an electric stimulus. First, to reduce the strength of the antiferromagnetic superexchange interaction in BiFeO3, we applied strain engineering to stabilize a highly strained phase. Second, the direction of the ferroelectric polarization was controlled by an electric field to enhance the Dzyaloshinskii–Moriya interaction in the highly strained BiFeO3 phase. Because of the magnetoelectric coupling in BiFeO3, a strong correlation between the modulated ferroelectricity and enhanced magnetization was observed. The tunability of this strong correlation by an electric field provides an intriguing route to control ferromagnetism in a single-phase multiferroic.

Citation

Yang, J., Kuo, C., Liu, H., Ding, H., Duan, C., Lin, H., …Chu, Y. (2016). Electrically enhanced magnetization in highly strained BiFeO3 films. NPG Asia Materials, 8(5), Article e269. https://doi.org/10.1038/am.2016.55

Journal Article Type Article
Acceptance Date Mar 1, 2016
Online Publication Date May 20, 2016
Publication Date May 20, 2016
Deposit Date Dec 5, 2016
Publicly Available Date Dec 9, 2016
Journal NPG Asia Materials
Publisher Springer Nature [academic journals on nature.com]
Peer Reviewed Peer Reviewed
Volume 8
Issue 5
Article Number e269
DOI https://doi.org/10.1038/am.2016.55

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http://creativecommons.org/licenses/by/4.0/

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This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/





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