Barton, C. W. and Slater, T. J. A. and Rowan-Robinson, R. M. and Haigh, S. J. and Atkinson, D. and Thomson, T. (2014) 'Precise control of interface anisotropy during deposition of Co/Pd multilayers.', Journal of applied physics., 116 (16). p. 203903.
We demonstrate the control of perpendicular magnetic anisotropy (PMA) in multilayer films without modification of either the microstructure or saturation magnetization by tuning the Ar+ ion energy using remote plasma sputtering. We show that for [Co/Pd]8 multilayer films, increasing the Ar+ ion energy results in a strong decrease in PMA through an increase in interfacial roughness determined by X-ray reflectivity measurements. X-ray diffraction and transmission electron microscope image data show that the microstructure is independent of Ar+ energy. This opens a different approach to the in-situ deposition of graded exchange springs and for control of the polarizing layer in hybrid spin transfer torque devices.
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|Publisher Web site:||https://doi.org/10.1063/1.4902826|
|Publisher statement:||© 2014 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Barton, C. W., Slater, T. J. A., Rowan-Robinson, R. M., Haigh, S. J., Atkinson, D. & Thomson, T. (2014). Precise control of interface anisotropy during deposition of Co/Pd multilayers. Journal of Applied Physics 116(16): 203903 and may be found at https://doi.org/10.1063/1.4902826|
|Date accepted:||12 November 2014|
|Date deposited:||26 June 2018|
|Date of first online publication:||26 November 2014|
|Date first made open access:||No date available|
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