Fabrication of a large scale metasurface with high resolution and enhanced absorption

Abstract

Plasmonic metasurface nanostructures have the potential to enable nonlinear optical functionality in metasurfaces by reducing power operating thresholds and enabling ultra-thin subwavelength devices. However, low absorption caused by resistive losses of unwanted metallic appearance and irregular corners in the fabrication process significantly reduces this promise, leading the metasurface community toward the new approaches to fabricate large area metasurfaces with Electron Beam lithography (EBL). In this article, with controlled proximity effect and high dose exposure rate in EBL setup, large area (2 cm2) metasurfaces are fabricated with high resolution of structure. The effect of absorption resonance in Infrared (LWIR) is experimentally studied through Fourier Transform Infrared Spectroscopy (FTIR). The results signify that the metasurface with high resolution and fine metallic corners outperforms the fabricated prototype with metal residue and non-uniform corners. When compared to conventional EBL, our nanofabrication approach speeds the patterning time by three times. The experimental measurements reveal enhanced absorption performance at 8 µm wavelength. Whereas, the developed metasurface is numerically studied to explain the absorption performance with plasmonic field distributions. This approach could be used in optoelectronic devices involving plasmonic applications, such as biosensing and infrared imaging.